Thermoelectric power for thermally deposited cadmium telluride films

Main Article Content

M. F. A. Alias

Abstract

Thermal evaporation method has used for depositing CdTe films
on corning glass slides under vacuum of about 10-5mbar. The
thicknesses of the prepared films are400 and 1000 nm. The prepared
films annealed at 573 K. The structural of CdTe powder and prepared
films investigated. The hopping and thermal energies of as deposited
and annealed CdTe films studied as a function of thickness. A
polycrystalline structure observed for CdTe powder and prepared
films. All prepared films are p-type semiconductor. The hopping
energy decreased as thickness increased, while thermal energy
increased.

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How to Cite
1.
Thermoelectric power for thermally deposited cadmium telluride films. IJP [Internet]. 2019 Feb. 10 [cited 2024 Mar. 29];13(26):38-41. Available from: https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/281
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How to Cite

1.
Thermoelectric power for thermally deposited cadmium telluride films. IJP [Internet]. 2019 Feb. 10 [cited 2024 Mar. 29];13(26):38-41. Available from: https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/281

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