Enhanced hydrogen gas sensitivity employing sputtered deposited NiO thin films | Iraqi Journal of Physics

Enhanced hydrogen gas sensitivity employing sputtered deposited NiO thin films

Published: 03-02-2019

DOI: https://doi.org/10.30723/ijp.v14i30.210

Keywords:

Nickel oxide, Sputtering, Thin film, Sensitivity.

Afaf F. Sultan

Issue

Vol. 14 No. 30 (2016)

Section

Articles

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.

© 2023 The Author(s). Published by College of Science, University of Baghdad. This is an open-access article distributed under the terms of the Creative Commons Attribution 4.0 International License.

How to Cite

1.

Sultan AF. Enhanced hydrogen gas sensitivity employing sputtered deposited NiO thin films. IJP [Internet]. 2019 Feb. 3 [cited 2025 Jul. 21];14(30):150-7. Available from: https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/210

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Journal Information

Journal: Iraqi Journal of Physics
Publisher: University of Baghdad
Iraqi Journal of Physics is a peer-reviewed and open-access
Print ISSN: 2070-4003
Online ISSN: 2664-5548
Publishing Frequency:
Three times a year (from 2009- 2016)
Quarterly (from 2017)
Launched Date: 2002
Abbreviation: IJP
Each published paper in IJP has a digital object identifier (DOI) number

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2024 Acceptance Rate: 51%

2023 Acceptance Rate: 43%

2022 Acceptance Rate: 48%
2021 Acceptance Rate: 44%
2020 Acceptance Rate: 47%
2019 Acceptance Rate: 70%

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are licensed under Creative Commons Attribution 4.0 International License

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