Enhanced hydrogen gas sensitivity employing sputtered deposited NiO thin films | Iraqi Journal of Physics

Enhanced hydrogen gas sensitivity employing sputtered deposited NiO thin films

Published: Feb 3, 2019

DOI: https://doi.org/10.30723/ijp.v14i30.210

Keywords:

Nickel oxide, Sputtering, Thin film, Sensitivity.

Afaf F. Sultan

How to Cite

1.

Sultan AF. Enhanced hydrogen gas sensitivity employing sputtered deposited NiO thin films. IJP [Internet]. 2019 Feb. 3 [cited 2024 Nov. 21];14(30):150-7. Available from: https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/210

Issue

Vol. 14 No. 30 (2016)

Section

Articles

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.

© 2023 The Author(s). Published by College of Science, University of Baghdad. This is an open-access article distributed under the terms of the Creative Commons Attribution 4.0 International License.

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Journal Information

Journal: Iraqi Journal of Physics
Publisher: University of Baghdad
Iraqi Journal of Physics is peer-reviewed and open access
Print ISSN: 2070-4003
Online ISSN: 2664-5548
Publishing Frequency:
Three times a year (2009 - 2017)
Quarterly (2017 – till now)
Launched Date: 2002
Abbreviation: IJP
Each published paper in IJP has a digital object identifier (DOI) number

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2022 Acceptance Rate: 48%
2021 Acceptance Rate: 44%
2020 Acceptance Rate: 47%
2019 Acceptance Rate: 70%
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