Effect of sputtering power on optical Properties of RF sputtering deposited Ti6Al4V Thin Films
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Abstract
Ti6Al4V thin film was prepared on glass substrate by RF
sputtering method. The effect of RF power on the optical properties
of the thin films has been investigated using UV-visible
Spectrophotometer. It's found that the absorbance and the extinction
coefficient (k) for deposited thin films increase with increasing
applied power, while another parameters such as dielectric constant
and refractive index decrease with increasing RF power.
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© 2023 The Author(s). Published by College of Science, University of Baghdad. This is an open-access article distributed under the terms of the Creative Commons Attribution 4.0 International License.
How to Cite
1.
Khalaf MK. Effect of sputtering power on optical Properties of RF sputtering deposited Ti6Al4V Thin Films. IJP [Internet]. 2019 Jan. 8 [cited 2024 Dec. 23];15(33):71-7. Available from: https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/142